CLINIC REGISTRATION

You will use the form below to register for clinics. Please be aware that you cannot enroll in a clinic and an externship in the same semester. To learn more about the Clinics and the registration process, you can attend the Clinic Information Sessions from February 23rd and February 24th (Room 201, 12:20-1:20 PM) or view the recording which will linked below following those sessions.

This registration period is for Fall 2026 AND Spring 2027.

In addition to the Clinic Registration form below, the Intellectual Property Clinic (IP), the Caritas Clemency Clinic (CCC), and the Clinic for Law and Entrepreneurship (CFLE) also require advanced applications.

NOTE: the Clemency Clinic is a full year commitment. Also, the CFLE will only run in Spring 2027.

Advance applications for IP, CCC and CFLE will open on Friday February 27, 2026, and close on Friday March 13, 2026. Students who submit the advance applications must also complete the Registration form below. Students who do not submit an advanced application by the March 13^th due date will not be considered for enrollment in one of those three clinics. 

The Registration form below must be completed for ALL clinics, including CCC, CFLE, and IP. 

Registration will take place beginning at 8 AM March 9, 2026, through 11:59 PM on March 13, 2026. You must register for a clinic by 11:59 pm on March 13th to be considered for enrollment. When choosing clinics from the drop-down boxes below, be sure to do so in your order of preference. Students who have submitted advanced applications must include their preferred clinic in their selections.

Advanced Application Forms

CCC, IP, and CFLE will select students based on their applications. The remaining clinics will register students by lottery. We cannot guarantee that every student will be enrolled in a clinic. Students will be notified of their enrollment status on March 19, 2026, prior to the start of regular course registration so that they may plan their schedule accordingly.

Preference is given to 3L students, although 2L students will also be considered.